LOW PRESSURE CHEMICAL VAPOR DEPOSITION SYSTEM
LOW PRESSURE CHEMICAL VAPOR DEPOSITION SYSTEM
LPCVD system: Create graphene and carbon nanotubes in a research setting. Incredible gas, pressure, and temperature control.
广西科米瑞实验仪器设备有限公司生产销售 Angstrom Engineering LOW PRESSURE CHEMICAL VAPOR DEPOSITION SYSTEM，可提供产品参数、报价和售后服务咨询，价格面议。
← 返回产品列表Designed and manufactured to meet the high temperature and rapid cooling requirements of graphene and CNT research, Angstrom Engineering's® LPCVD (Low Pressure Chemical Vapor Deposition) system will fit in nicely in your lab.
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Process Specific
Quantum Series
Perovskite Series
Indium Series
Reticle Ion Beam Sputter
Linear Sputter
2D Coatings
Space/Environmental Simulation
Glove Box Integration
The tool you need to study & utilize graphene & carbon nanotubes.
We engineered a water-cooled furnace that can reach 1100°C in 10 minutes and cool down below 800°C in a mere 2 minutes. Controlled graphene growth is ensured, and the Low-Pressure Chemical Vapor Deposition system keeps processing times to a minimum. Various chamber tube sizes are available between Ø 2 in and Ø 8 in, allowing the processing of single small samples up to batches in 6-inch wafers.
Process Specific Advantages
Reactor
Ø 50 mm-Ø 200 mm quartz tube chamber
Interchangeable Quartz tubes of various sizes as required
Accommodates Individual or multiple substrates up to 150 mm x 150 mm
Upstream end flange with quick connections to gas manifold
Downstream end flange with quick connections to pumping and gauging
Temperature/Pressure Control
The Low Pressure Chemical Vapor Deposition system features a single-zone quartz lamp furnace with a 6-inch uniform temperature zone
Auto-tuning feature provides very stable temperature control
Rapid heating to 1100°C in 10 minutes
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