NEBULA CLUSTER
Our Nebula Cluster integrated vacuum deposition system cuts device fabrication time, fitted with PVD, CVD, ALD, and thin film enhancement.
广西科米瑞实验仪器设备有限公司生产销售 Angstrom Engineering NEBULA CLUSTER，可提供产品参数、报价和售后服务咨询，价格面议。
← 返回产品列表Angstrom’s pinnacle of automation, engineering precision, user control, and collaboration with you, our partner. These Nebula Cluster integrated vacuum systems are designed specifically to meet our client's process requirements. The number and type of vacuum modules are customer-selected and provide room for future expansion potential.
Designed for the lab that requires a safe and reliable tool that produces repeatable, high-quality thin films in a compact footprint.
We dream with you to determine the modules that will bring your potential innovations to reality. PVD, CVD, ALD, masking and parking transfer, stages with heating/cooling, sources that assist with cleaning, variable angle deposition and everything else current technology allows.
BUILD OPTIONS
The Nebula Cluster integrated vacuum system includes a centralized robotic hub connecting everything, all controlled with our integrated and simple-to-use recipe-driven software.
Substrate cleaning and preparation using plasma or ion beam sources
Multiple vacuum deposition modules are available for PVD, CVD, ALD, & application focused modules, such as Quantum Series
Substrate and mask storage cassettes can accommodate 25 or more sample trays as needed
Distribution modules using SCARA robots are sized to meet your requirements
Glovebox environments can be integrated into one or more modules
Substrate Size/Throughput
We have built modules that accommodate standard semiconductor wafer form factors, as well as typical display glass, including modules for Gen. 2 (360 mm x 465 mm) and larger.
Throughput depends on process duration and complexity. However, the AERES software platform optimizes layer-to-layer transitions to reduce overall process time.
Nebula Cluster In The Field
Advanced Process Control Software
PC/PLC-controlled recipes for single, batch, or automated processes.
Advanced data logging and process tracking ensure consistent and repeatable processes.
High-resolution control provides impressive low-rate stability and consistent doping ratios.
The central control station manages each module and schedules the processes in each chamber.
Independent control of multiple chambers (if applicable).
Complex recipes can be created and modified easily.
Automatic PID control loop tuning significantly reduces process development time.
CLICK HERE
请填写必填信息，我们将在工作日尽快回复。