PLD

Our Pulsed Laser Deposition (PLD) systems are engineered to deliver unparalleled precision in thin-film fabrication for advanced material research.

Whether used as a standalone platform or seamlessly integrated into a cluster system, our PLD solutions offer a level of control needed for the development of next-generation materials.

Features & Capabilities

Standalone & Cluster Integration

Expandable for high-throughput pilot or commercial-scale manufacturing.

Stoichiometric Fidelity

Mimics target composition

Uniform Films & Fast Prototyping

Optimized growth conditions

Epitaxial Growth Capability

Enhances surface diffusion and impurity desorption

Real-Time Monitoring

RHEED for real-time analysis

Partnering with Angstrom Engineering®

Collaborate with our expert team for custom PLD solutions tailored to your material and process requirements. From design to optimization, we ensure precision, reliability, and innovation for your research goals. Standalone or cluster-integrated solutions available.

✔ High-Temperature Superconductors – Ideal for Josephson Junctions and quantum computing research

✔ Transparent Conductive Oxides – Deposit precise chemistries without complex reactive sputtering process

✔ Combinatorial PLD – Create solid solutions with compositional gradients for rapid property analysis

✔ High Entropy Materials – Deposit multi-element systems with chemical disorder for tunable properties

ADVANCED PROCESS CONTROL SOFTWARE

PC/PLC-controlled recipes for single, batch, or automated processes.

Advanced data logging and process tracking ensure consistent and repeatable processes.

The central control station manages each module and schedules the processes in each chamber.

Independent control of multiple chambers (if applicable).