Optical Edge Bead Exposure
Optical Edge Bead Exposure
COMPANY Sales Offices Career Opportunities。PRODUCTS Photoresist Coater Photoresist Developer P9000 Integrated Lithography System Wafer on Tape Frame Wafer Scrubber/Cleaner Metal L
广西科米瑞实验仪器设备有限公司生产销售 C&D Semiconductor Optical Edge Bead Exposure，可提供产品参数、报价和售后服务咨询，价格面议。
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COMPANY Sales Offices Career Opportunities
PRODUCTS Photoresist Coater Photoresist Developer P9000 Integrated Lithography System Wafer on Tape Frame Wafer Scrubber/Cleaner Metal Lift-Off System Wafer Inspection Systems Wafer Sorter Wafer Microscope Loader Systems Closed Lid Co-Rotation Coater Wafer Alloy – Anneal Optical Edge Bead Exposure Spray Coating Piezoelectric Wafer Processing
P9000 Integrated Lithography System
Wafer Microscope Loader Systems
Piezoelectric Wafer Processing
PARTS C&D Platform Parts SVG Parts
Ultraviolet Optical Edge Bead Removal System for Precise, Chemical-Free Operation
Introducing an alternative method to traditional chemical-driven edge bead removal, the Optical Edge Bead Exposure “OEBE” system is an independent module in the P9000 Coating & Developing System capable of exposing both flat and notched wafers quickly and efficiently. The exposure system utilizes a high intensity LED light source to generate a steady beam of 365nm wavelength, or a mercury arc lamp for other ultraviolet wavelength requirements.
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