EVG ® 610

UV Nanoimprint Lithography System

Mask alignment system with UV Nanoimprint Lithography capability from small pieces up to 150 mm

The tool supports a variety of standard lithography processes, such as vacuum-, soft-, hard- and proximity exposure mode, with the option of back-side alignment. In addition, the system offers conventional UV Nanoimprint Lithography (soft UV-NIL) and allows quick processing and re-tooling for changing user requirements with a conversion time between lithography and NIL of just a few minutes. Its advanced multi-user concept can be adapted from beginners to expert level, thus making it ideal for universities and R&D applications.

Features

Top-side and bottom-side alignment capability

High-precision alignment stage

Automated wedge error compensation mechanism

Motorized and recipe-controlled exposure gap

Supports the latest UV-LED technology

Minimized system footprint and facility requirements

Step-by-step process guidance

Remote tech support

Multi-user concept (unlimited number of user accounts and recipes, assignable access rights, different user interface languages)

Agile processing and conversion between lithography processes

Table top or stand-alone version with anti-vibration granite table

Additional capabilities: Bond alignment IR alignment Nanoimprint lithography µ-contact printing

Bond alignment

IR alignment