EVG ® 620 NT

Smart NIL ® UV Nanoimprint Lithography System

Mask alignment system with UV Nanoimprint Lithography capability featuring EVG´s proprietary SmartNIL ® technology up to 100 mm

Known for its flexibility and reliability, the EVG620 NT provides state-of-the-art mask alignment technology on a minimized footprint. Operator-friendly software, minimized time for mask and tooling changes, as well as efficient worldwide service support makes them the ideal solution for any R&D environment up to semi-automated volume production. The tool supports a variety of standard lithography processes, such as vacuum-, soft-, hard- and proximity exposure mode. Furthermore, the EVG’s proprietary SmartNIL technology is supported.

SmartNIL is the industry leading NIL technology, enabling the patterning of extremely small features down to less than 40 nm*, as well as a wide range of structure sizes and shapes. SmartNIL in combination with multi-use soft-stamp technology enables unmatched throughput with considerable cost-of-ownership advantages while preserving scalability and maintenance-friendly operation. EVG’s SmartNIL redeems the long-term promise of nanoimprinting being a low-cost and high-volume alternative lithography technology for mass manufacturing of micro- and nanoscale structures. *resolution dependent on process and template

Features

Top-side and bottom-side alignment capability

High-precision alignment stage

Automated wedge compensation sequence

Motorized and recipe controlled exposure gap

Supports the latest UV-LED technology

Minimized system footprint and facility requirements

Step-by-step process guidance

Remote tech support

Multi-user concept (unlimited number of user accounts and recipes, assignable access rights, different user interface languages)

Agile processing and conversion re-tooling

Table top or stand-alone version with anti-vibration granite table

Additional capabilities: Bond alignment IR alignment SmartNIL µ-contact printing

Bond alignment