EVG ® 6200 NT

SmartNIL UV Nanoimprint Lithography System

Mask alignment system with UV Nanoimprint capability featuring EVG´s proprietary SmartNIL ® technology up to 150 mm

Known for its automation flexibility and reliability, this system provides state-of-the-art mask alignment technology on a minimized footprint. Operator-friendly software, minimized time for mask and tooling changes, as well as efficient worldwide service and support makes it the ideal solution for any R&D environment up to semi-automated volume production. The tool supports a variety of standard lithography processes, such as vacuum-, soft-, hard- and proximity exposure mode. Furthermore, the EVG’s proprietary SmartNIL technology is supported.

SmartNIL is the industry-leading NIL technology, enabling the patterning of extremely small features down to less than 40 nm*, as well as a wide range of structure sizes and shapes. SmartNIL in combination with multi-use soft-stamp technology enables unmatched throughput with considerable cost-of-ownership advantages while preserving scalability and maintenance-friendly operation. EVG’s SmartNIL redeems the long-term promise of nanoimprinting being a low-cost and high-volume alternative lithography technology for mass manufacturing of micro- and nanoscale structures. *resolution dependent on process and template

Features

Top-side and bottom-side alignment capability

High-precision alignment stage

Automated wedge compensation sequence

Motorized and recipe controlled exposure gap

Supports the latest UV-LED technology

Minimized system footprint and facility requirements

Step-by-step process guidance

Remote tech support

Multi-user concept (unlimited number of user accounts and recipes, assignable access rights, different user interface languages)

Agile processing and conversion re-tooling

Table top or stand-alone version with anti-vibration granite table

Additional capabilities: Bond alignment IR alignment Smart NIL ® µ-contact printing

Bond alignment