EVG 7200
Automated SmartNIL ® UV Nanoimprint Lithography System。Full-field UV Nanoimprint Lithography system up to 200 mm utilizing flexible stamps, featuring EVG´s proprietary SmartNIL ®
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Automated SmartNIL ® UV Nanoimprint Lithography System
Full-field UV Nanoimprint Lithography system up to 200 mm utilizing flexible stamps, featuring EVG´s proprietary SmartNIL ® technology
The EVG7200 system leverages EVG's innovative SmartNIL technology enabling manufacturing of micro- and nanostructures with high pattern fidelity and low residual layer. Exposure with tunable intensity is based on LED lamps. The system is capable to quickly solidify a large variety of UV-curable materials improving consequently the throughput. A high yield is obtained by a controlled and smooth demolding supported by a force measurement. Capable of printing nanostructures over a large area with unmatched throughput and low cost of ownership, the EVG7200 system with SmartNIL technology is ideally suited for volume production of next-generation microfluidic and photonic devices, such as diffractive optical elements (DOEs).
*resolution dependent on process and template.
Features
Volume-proven imprinting technology with superior replication fidelity
Proprietary SmartNIL® technology with multiple-use polymer stamp technology
Integrated imprinting, UV curing demolding, and working stamp fabrication
Available in manual or automated configuration
Automated cassette-to-cassette handling plus semi-automated R&D mode
Substrate size from pieces to 200 mm
Chuck with heating function
Optional top-side alignment
Optional mini-environment
Open platform for all commercially available imprint materials
Scalability from R&D to production
System housing for best process stability and reliability
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