EVG ® 7200 LA

Large-Area SmartNIL ® UV Nanoimprint Lithography System

UV Nanoimprint Lithography system for large area panels

The EVG7200 Large-Area UV Nanoimprint System scales nanoimprint lithography (NIL) to panel-size (Gen) substrates and is equipped with the latest evolution of SmartNIL technology. For applications such as displays, wire grid polarizers, biotechnology and photonic elements, which cannot be reduced in size, it is crucial to increase substrate utilization efficiency by increasing the pattern area. NIL has proven to be the most cost-efficient way to enable fabrication of nanopatterns on large areas as it is not limited by optical systems and can provide the best pattern fidelity for the smallest structures.

SmartNIL provides superior conformal imprint results down to 40 nm* utilizing a very robust and controllable tooling process. With unique and proven equipment capabilities, including unmatched ease of use, in conjunction with a high level of process expertise, EVG fulfills industry needs by driving nanoimprinting to the next level.

*resolution dependent on process and template

Features

Proprietary SmartNIL® technology providing unmatched conformal imprinting over large areas

Superior replication fidelity and uniformity

Multiple-use polymer working stamp technology for longest master lifetime and significant cost savings

Robust and precisely controllable processing

Compatible with all commercially available imprint materials

Available in R&D and high-volume manufacturing configuration