PULSION
PULSION
IBS equipment meet Plasma immersion ion implantation is a versatile process。technology with wide applications in microelectronics
广西科米瑞实验仪器设备有限公司提供 Ion Beam Services PULSION 产品资料、选型咨询、供货报价和售后服务支持，价格面议。
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说明
IBS PULSION equipment meet < 10 nm requirements
Plasma immersion ion implantation is a versatile process
technology with wide applications in microelectronics
processing & materials engineering.
Simultaneous implantation of the full wafer
Ultra low energy ( down to 30 eV)
Conformal 3D implantation
3D doping (FINFET, DTI, pillars ...) for advanced logic & memory
Material modification to tailor stress, to engineer contact & Vt, to help process integration
Very high doses needed for DPG application
规格
| 型号 | PULSION |
|---|---|
| Technology | Plasma immersion ion implantation |
| Minimum energy | down to 30 eV |
| Implantation mode | Simultaneous implantation of the full wafer; conformal 3D implantation |
| Applications | 3D doping for advanced logic and memory; material modification; high dose DPG application |
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