HEX Series Thin Film Deposition Systems

THE HEX SERIES HEX CLUSTER HEX MINI HEX UHV APPLICATIONS INSIGHTS Linkedin Youtube The HEX Series Why the HEX Series? HEX vs HEX-L vs HEX-XL HEX Steel Deposition Sources FISSION – Magnetron Sputtering TES – Thermal Boat Evaporation TAU – Electron Beam Evaporation ORCA – Low Temperature Evaporation Sample Stages Glovebox Integration Automation Software Customisations HEX Cluster HEX MINI HEX UHV HEX UHV TAU UHV Applications Thin-Film Solar Cells Optical Coatings Thin-Film Batteries Teaching and Training Reactive Sputtering Sample Preparation Lift-off ITO Coatings Insights Webinars Techniques Articles Videos Testimonials Publications About Us Why The HEX Series? The HEX series of thin film deposition systems consist of a six-sided aluminium high-vacuum chamber that is lightweight yet rigid enough for most physical vapour deposition applications. The hexagonal structure supports six modular panels, including: Blank panel Viewport panel Deposition source panel QCM panel for in-situ monitoring Custom panel for third-party instrument integration Front access door (HEX-L/XL only) Load-lock access panel (HEX-L/XL only) HIGHLY MODULAR PVD SYSTEMS Thin Film Deposition Systems The HEX Series of thin film deposition systems are uniquely designed to be completely modular. Each thin film deposition system comes with detachable side panels. This allows users to begin with a relatively simple setup and upgrade or reconfigure their system in line with their research needs or budget. These upgrades are modular and simple to install, eliminating system downtime. The HEX Series includes the benchtop HEX and the larger HEX-L and HEX-XL Systems. (See “HEX vs HEX-L vs HEX-XL” page). The HEX Series Thin Film Deposition Systems THIN FILM DEPOSITION SYSTEMS THE HEX SERIES The HEX Series includes the benchtop HEX and the larger HEX-L and HEX-XL Systems HEX HEX-L HEX-XL HEX-L Mobile base-stand-mounted system Maximum Sample Size Diameter: 6" (150mm) Deposition Sources: Up to 6 Magnetron Sputter Size (Diameter): 2" or 3" Chamber Volume: 50L - (100L When Stacked) Base Pressure: <5×10-7 mbar* *Ultimate base pressure is on factory tested systems. Subsequent base pressure depends on a variety of factors such as chamber cleanliness, user operation and lab environment. HEX Benchtop or rack-mounted compact system Maximum Sample Size Diameter: 4" (100mm) Deposition Sources: Up to 3 Magnetron Sputter Size (Diameter): 2" Chamber Volume: 12 L - (24 L When Stacked) Base Pressure: 5×10-7 mbar* *Ultimate base pressure is on factory tested systems. Subsequent base pressure depends on a variety of factors such as chamber cleanliness, user operation and lab environment. HEX-L Mobile base-stand-mounted system Maximum Sample Size Diameter: 6" (150mm) Deposition Sources: Up to 6 Magnetron Sputter Size (Diameter): 2" or 3" Chamber Volume: 50L - (100L When Stacked) Base Pressure: <5×10-7 mbar* HEX-XL Larger mobile base-stand-mounted system Maximum Sample Size Diameter: up to 12" (300mm) Deposition Sources: Up to 6 Magnetron Sputter Size (Diameter): 3" or 4" Chamber Volume: 86 L - (172 L When Stacked) Base Pressure: <5×10-7 mbar* The HEX Series of thin film deposition systems provide a unique, versatile range of deposition options for your research and implementation applications. No matter where your research takes you, the HEX Series will be by your side. At Korvus Technology we take your privacy seriously. Unit 1 Barnes Wallis Court Cressex Business Park Wellington Road, High Wycombe, Buckinghamshire, HP12 3PS sales@korvustech.com +44 1280 852096 © 2026 Korvus Technology | All Rights Reserved | Web Design by JWD