scia Clean 1000/1500/3000
scia Clean 1000/1500/3000
High-Quality Cleaning and Qualification up to 3 m in dia. and 3.4 m in length
广西科米瑞实验仪器设备有限公司生产销售 scia Systems scia Clean 1000/1500/3000，可提供产品参数、报价和售后服务咨询，价格面议。
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High-Quality Cleaning and Qualification up to 3 m in dia. and 3.4 m in length
The scia Clean 1000/1500/3000 systems are used for dry-cleaning of 3-dimensional shaped substrates with weights up to 14 tons. The chamber design and functionality ensures a very good base pressure and allows to quantify even small residual contaminations on the substrate by mass spectroscopy measurement.
Features & Benefits
Low base pressure and fast pumping due to electropolished and heated vacuum chamber
Separate substrate heating for improved desorption
Qualification of residual contamination by high-sensitive mass spectroscopy
Selectable quantity of plasma sources for advanced cleaning with H 2 plasma
Recipes for repeatable temperature ramps and fully automated cleaning cycles
Transfer system for loading of heavy substrates
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scia Clean 1000
scia Clean 1500
Applications
Ultra-high purity cleaning of X-ray optics
Cleaning of components for beam line accelerators
Outgassing qualification of complex vacuum assemblies
Principle
Removing of contaminations from 3-dimensional shaped substrates by using ultra-high vacuum (vacuum desorption)
Further cleaning progress with optional heating of substrate and/or chamber (thermal desorption) and applying plasma treatment
Dry-Cleaning allows the removal of substrate surface contaminations in vacuum with different methods. These methods can be applied successively to optimize the cleaning results.
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