scia Coat 200
scia Coat 200
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Products Ion Beam Etching Ion Beam Trimming Ion Beam Sputtering scia Cluster 200 more...
Ion Beam Etching
Ion Beam Trimming
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High Quality Multilayer Deposition
The scia Coat 200 has an excellent uniformity for coatings on up to 200 mm substrates. By using ion beam sputter deposition instead of other deposition processes, smooth and defect-free films can be achieved. In-situ optical monitoring ensures excellent process stability. Additionally, the system enables handling of wafer as well as arbitrary shaped substrates.
Features & Benefits
Excellent uniformity by substrate rotation and tilt
Up to 5 water-cooled target materials on a rotational holder for in-situ change
Recipe-controlled multilayer deposition with quartz crystal oscillator and/or optical thickness monitor (OTM) and test glass changer
Direct wafer handling or adaptation to variable substrate sizes with carrier handling
Equipped with a 350 mm ion beam source as assist source, also usable for ion beam etching processes
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Single chamber with cassette handling
Single chamber with single substrate load lock
Applications
Transmittance and reflectivity diagram of a high-reflective mirror. Deposition of quarter-wave stack consisting of tantalum(V)-oxide and silicon dioxide for high-reflective mirror @ 630 nm. Reflectivity > 99.9 % and transmittance 15-20 ppm.
Optical coatings for high- and anti-reflective layers, bandpass and notch filters
Multilayer films for magnetic sensors (GMR, TMR, spintronics)
High laser damage threshold coatings
Deposition of dielectric and metal layers
In-situ preprocessing of substrates (etching, cleaning, smoothing)
Application Note
Dielectric Coatings on large substrates
High- and Anti-Reflective Coatings with Ta 2 O 5 and SiO 2
规格
| 型号 | scia Coat 200 |
|---|---|
| Product category |
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