scia Coat 500
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Products Ion Beam Etching Ion Beam Trimming Ion Beam Sputtering scia Cluster 200 more...
Ion Beam Etching
Ion Beam Trimming
Ion Beam Sputtering
scia Cluster 200
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Large Area Multilayer Deposition
The scia Coat 500 is used for homogeneous coating of large substrates for precision optics. Recipe controlled deposition processes allow a repeatable quality of multilayer stacks. Thereby, a changeable shaper system (up to 4 shapers) compensates parameter and/or material dependent inhomogeneity effects and enables the deposition of defined gradient films.
Features & Benefits
Excellent uniformity due to linear movement
Up to 6 water-cooled target materials on a rotational holder for in-situ change
Recipe controlled multilayer deposition with quartz crystal oscillator and/or optical thickness monitor (OTM)
Controlled movement of linear axis system for gradient coating or surface error correction
Optional substrate heating up to 250 °C to optimize film stress
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Applications
X-ray reflectivity measurement and fitting curve of a [C+Ni]80-multilayer stack. Visibility of 4th order Bragg peak shows the excellent repeatability of single layer thicknesses.
Multilayer films for optical filters, X-ray mirrors and synchrotron mirrors
Optical coatings for high- and anti-reflective and dielectric layers
Deposition of films with property gradients (Göbel mirrors)
Ion beam smoothing
One-dimensional ion beam figuring
Application Note
Dielectric Coatings on large substrates
High- and Anti-Reflective Coatings with Ta 2 O 5 and SiO 2
Principle
Primary source sputters material from a target to the face-down oriented substrate
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