中文English
科米瑞
首页联系我们
  1. 首页
  2. 产品中心
  3. 产品详情
科米瑞

© Copyright 科米瑞 2026

产品中心产品目录应用领域知识中心常见问题联系我们隐私政策桂ICP备2020008265号-5
广西科米瑞实验仪器设备有限公司13422079856122816084@qq.com
分析检测仪器生命科学仪器显微成像与光学样品前处理温控加热与制冷真空泵阀与流体科米瑞仪器应用领域实验室仪器选型

scia Opto 300

scia Opto 300

Products Ion Beam Etching Ion Beam Trimming Ion Beam Sputtering scia Cluster 200 more...

品牌: scia Systems价格: 面议服务区域: 全国

广西科米瑞实验仪器设备有限公司提供 scia Systems scia Opto 300 产品资料、选型咨询、供货报价和售后服务支持,价格面议。

立即询价查看更多详情咨询该型号
← 返回产品列表
scia Opto 300
说明规格FAQ

说明

Products Ion Beam Etching Ion Beam Trimming Ion Beam Sputtering scia Cluster 200 more...

Ion Beam Etching

Ion Beam Trimming

Ion Beam Sputtering

scia Cluster 200

Technologies

Applications Application Notes White Paper Publications Research Projects Learning

Application Notes

White Paper

Publications

Research Projects

Learning

Company About us News Events

About us

Contact Head Office Worldwide Visit us

Head Office

Worldwide

Visit us

scia-jobs.de

Precision in Optical Coating

The scia Opto 300 is used for uniform coating of precision optics. With up to 6 targets for flexible multilayer deposition, even a mixing of target materials is possible. Two loading positions allow continuous and fully automatic processing of the substrates. Optical in-situ monitoring with integrated test glass changer ensures highest precision and optimized uniformity of coating.

Features & Benefits

Variable substrate sizes up to 300 mm dia.

Automatic loading with two loading positions for continuous processing

Up to 6 target materials on a rotatable trum, each target up to 300 mm x 300 mm, with optimized geometry for mixed layers or smooth transition between layers

Excellent process uniformity by substrate rotation with up to 60 rpm

In-situ optical thickness monitor (OTM) and test glass changer

Optimized geometry for coating with low stress

Need more Information? Contact us!

Front view

Back view

Applications

Application Example: Anti-reflex coating of a multilayer stack consisting of Ta2O5

and SiO2 on TGG, designed to be transparent for typical laser lines of 633 nm

and 1064 nm | picture left: structure of the layer stack | picture right: Transmission spectra measured with transmission mode of ellipsometer. The target values of the reflectivity could be reached.

Dielectric mirrors (e.g. rugate filters)

Optical coatings for high- and anti-reflective layers, bandpass and notch filters

High laser damage threshold coatings

Deposition of refractive index gradient layers

In-situ preprocessing of substrates (etching, cleaning, smoothing)

规格

型号scia Opto 300
Product categoryIon Beam Sputtering

相关产品

Eft-90 NMR Spectrometers

Eft-90 NMR Spectrometers

EFT-90

提交需求

请填写必填信息,我们将在工作日尽快回复。

Substrate size (up to)
300 mm dia.
Substrate holderSubstrate rotation up to 60 rpm, includes optical thickness monitor (OTM) and test glass changer
Ion beam sourcesSputter source: 120 mm circular RF source (RF120-e) Assist source: 120 mm circular RF source (RF120-e)
NeutralizerRF driven plasma bridge neutralizer (N-RF)
Target holderTarget drum with 6 water-cooled targets (each up to 300 mm x 300 mm)
Base pressure< 5 x 10 -8 mbar
System dimension (W x D x H)4.60 m x 1.80 m x 2.20 m, for single chamber with double substrate load lock (without electrical rack and pumps)
ConfigurationsSingle chamber with double substrate load lock
Software interfacesSECS II / GEM, OPC
Typical deposition ratesSi: 6 nm/min, SiO 2 : 9 nm/min, Ta 2 O 5 : 6 nm/min
Uniformity variation≤ 0.8 % (σ/mean) for 300 mm

FAQ