GENxplor
Industry’s most advanced, high performance R&D system chosen by leading researchers
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：High quality epitaxial layers on substrates up to 3″ in diameter
：Extreme E-beam temperature heater (>1850°C)
：Unique, single frame architecture improves ease-of-use, provides convenient source access and enhanced serviceablility
：Efficient, all-in-one design combines manual system with on-board electronics for 40 percent lab space savings compared to other MBE systems
：Ideal for cutting-edge research on a wide variety of materials, including GaAs, nitrides, and oxides
：Molly® software integrates easy recipe writing, automated growth control and always-on data recording
：Optional Nova™ ultra high temperature substrate heater for proven performance at 1850°
：Direct scalability to GEN20™, GEN200® and GEN2000® MBE systems
| 型号 | GENxplor |
|---|---|
| 产品类别 | Molecular Beam Epitaxy System |
| Application | rformance R&D system chosen by leading researchers High quality epitaxial layers on substrates up to 3 |
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