Propel 300mm GaN MOCVD System for 5G
Fully Automated, Single Wafer Cluster System Enables Production 5G RF, Photonics and advanced CMOS Devices on 300mm Substrates.
广西科米瑞实验仪器设备有限公司提供 Veeco Propel 300mm GaN MOCVD System for 5G 产品资料、选型咨询、供货报价和售后服务支持，价格面议。
← 返回产品列表：Fully Automated, Single Wafer Cluster System Enables Production 5G RF, Photonics and advanced CMOS Devices on 300mm Substrates.
：The Propel™ 300mm fully automated single wafer cluster system is the only industry proven GaN MOCVD tool that enables production of 5G RF, Photonic and advanced CMOS devices on 300mm substrates.
：Featuring a single-wafer reactor platform, the Propel 300mm system is capable of producing best-in-class, high quality epitaxy films on 300mm wafers with exceptional uniformity, repeatability and yield. The Propel 300mm System is configurable with up to 3 modular cluster chambers and offers automated cassette to cassette handling for maximum flexibility and productivity.
：The single-wafer reactor is based on Veeco’s leading TurboDisc® design including the IsoFlange™ and SymmHeat™ technologies that provide laminar flow and uniform temperature profile across the entire wafer. Customers can easily transfer processes from the Veeco single wafer reactor Propel and Propel HVM systems to the Propel 300mm GaN MOCVD system for fast development to production.
| 型号 | Propel 300mm GaN MOCVD System for 5G |
|---|---|
| 产品类别 | MOCVD System |
| Application | 5G RF, Photonics and advanced CMOS Devices on 300mm Substrates |
| Technology | MOCVD tool that enables production of 5G RF, Photonic and advanced CMOS devices on 300mm substrates |
请填写必填信息，我们将在工作日尽快回复。