HP8 Hot Plate for Manual Coating
HP8 hot plate: The flexible R&D and small-scale coating solution for 200mm substrates with fast, uniform heating and intuitive control. Discover now ➤
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LabSpin 系列 Spin Coater & Developer
LabSpin6 & LabSpin8 are the versatile manual spin coaters and developers engineered for R&D and laboratory environments. Discover now ➤
MCS8 Manual 涂胶与显影 System
MCS8: Maximum functionality on minimal footprint in a versatile 集群系统 configuration perfect for start-ups, labs & small-scale production. Discover now ➤
RCD8 Semi-Automated Coater & Developer
The RCD8 is the highly versatile coater and developer designed for wafers up to 200 mm for R&D and small-scale production. Discover now ➤
JETx Automated Inkjet Printer
JETx is SUSS’s advanced inkjet printer for high-volume functional materials – delivering precision, throughput, and low cost of ownership. Discover now ➤
LP50 R&D Inkjet Printer
The LP50 is your versatile R&D inkjet printer for functional materials, enabling fast process development and material evaluation. Discover more ➤
MA12 Gen3 Mask Aligner
MA12 Gen3: Semi-automated 掩模对准 of wafers up to 300mm for advanced packaging, MEMS, and imprint lithography applications. Discover now ➤
MA200 Gen3 Mask Aligner
Specially designed for high-volume production, the MA200 Gen3 mask aligner is suited for the automated processing of wafers up to 200 mm. Discover now ➤
MA300 Gen3 Mask Aligner
The flagship mask aligner: MA300 Gen3 combines highest precision with unmatched flexibility for high-volume fabs of 200 and 300 mm wafers. Discover now ➤
MA/BA Gen4 系列 Mask and Bond Aligner
MA/BA Gen4: Versatile mask and bond aligner system for standard to advanced high-end processes, from R&D to high volume. Discover now ➤
MJB4 Mask Aligner
Compact, precise, and versatile: the MJB4 is the cost-effective manual mask aligner for R&D and low-volume production. Discover now ➤
NIL-SFT12 系列 stamp fabrication tool
The compact NIL-SFT 系列 for fast, precise production of high-quality working stamps for micro- and nanoimprint lithography.
NIL-SFT8 系列 Stamp Fabrication Tool
The compact NIL-SFT8 for fast, precise production of high-quality working stamps for micro- and nanoimprint lithography. Discover now ➤
DSC300 Gen3 Projection Scanner
DSC300 Gen3: High-throughput projection lithography scanner for 200mm and 300mm wafers in advanced packaging. Discover now ➤
ASx 系列 光掩模 Processing Platform
The ASx 系列 is the fully automated 光掩模 processing platform for advanced bake, resist strip, clean & develop on 250-65 nm wafers. Discover now ➤
MaskTrack Smart BD Automated 光掩模 System
MaskTrack Smart BD: The flagship platform for world-class 光掩模 baking & developing for advanced industrial lithography applications. Discover now ➤
- 中文译文待人工复核：Mask storage, handling or processing
- 中文译文待人工复核：MaskTrack Smart BD ensures most complex photomask manufacturing with high product integrity at industrial scale within a fully controlled and extremely clean environment.
Specialized 清洗 for 光掩模s
HMx 系列 is the semi-automated solution for pilot and small 系列 production of 光掩模 and challenging semiconductor applications. Discover now ➤
光掩模 processing for next-generation lithography
Tailored to needs of the semiconductor market。Key features of the Masktrack Pro 系列
HELOS
The proven HELOS series – with its classical parallel beam laser diffraction set-up – offers a powerful technology for particle size distribution analysis of...
- Sensor
- Measuring range/
- HELOS/BR
- 0.1 - 875 µm/ 5 | powders, suspensions, emulsions, sprays & aerosols
- HELOS/KR
- 0.1 - 8,750 µm/ 8 | powders, granules, suspensions, emulsions, sprays & aerosole
- HELOS/KR-Vario
- 0.1 - 8,750 µm/ 8 | powders, granules, suspensions, emulsions, sprays & aerosols, special applications
MYTOS & Co.
MYTOS integrates the established core technologies of HELOS laser diffraction and RODOS dry dispersion in a single robust body: a process-proven laser diffra...
- Sensor
- Versions | Measuring range/ Modules
- in-line
- MYTOS & TWISTER | 0.25 µm to 1,750 µm/ 5
- on-line
- MYTOS & TWISTER | 0.25 µm to 3,500 µm/ 6
- on-line
- MYTOS & MIXER | 0.25 µm to 1,750 µm/ 6
QICPIC
Applying components of highest performance our modular particle size and shape analyser QICPIC develops the full power of dynamic image analysis . High speed...
- Sensor
- Measuring range/ Modules | Frame rate/ fps | data rate
- QICPIC/L02
- 0.55 - 33,792 µm/ 4 from 7 | 85 @ 4.2 MP to 225 @ 1.5 MP | 5 GBit/s (1xUSB 3.0)
- QICPIC/L06
- 0.55 - 33.792 µm/ 4 from 7 | 175 @ 4.2 MP to 500 @ 1.5 MP | 10 GBit/s (2xCXP-5)
PICTOS & Co.
The powerful and proven system components of QICPIC are also available for process integration. With PICTOS & Co disperser and sensor of QICPIC are integrate...
- Sensor
- Versions | Measuring range/ Modules
- on-line
- PICTOS & TWISTER | 1.8 µm to 3,500 µm/ 4
- on-line
- PICCELL | 1 µm to 5,000 µm/ 5
- at-line
- PICTOS & VIBRI | 1.8 µm to > 3,500 µm*/ 4
NANOPHOX
In general, the acquisition of scattered light intensities of particles under thermal motion is deployed for nanoparticle characterisation (principle of dyna...
- Product category
- Particle size and particle shape measurement instrument
- 型号/页面
- NANOPHOX
NIMBUS
The compact table-top measurement instrument NIMBUS is the efficient implementation of the tried and tested ultrasonic extinction technology for the analysis...
- Product category
- Particle size and particle shape measurement instrument
- 型号/页面
- NIMBUS
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