Korvus Technology HEX UHV 超高真空 PVD 系统
HEX UHV 产品资料标题为 World's Most Modular UHV System，并说明其为 HEX 系列 PVD instruments 的最新发展。
- 型号
- HEX UHV
- 产品类别
- Ultra-high vacuum PVD system
- 真空能力
- 1 × 10^-10 mbar
- 平台
- HEX Series PVD instruments
Beneq Transmute™
brings ALD precision to high-volume production. Built on Beneq’s proprietary 3-step ALD approach – combining plasma pre-treatment, plasma-enhanced ALD, and t...
- 型号或系列
- Transmute™
- 产品类别
- High-volume semiconductor ALD platform
- 包含型号
- Beneq Transmute
- Wafer size
- 200 mm fabs
Beneq Prodigy™
Learn the technical specifications of the Beneq Prodigy™, such as dimensions, process types, processing temperature range, and substrate types.
- 型号或系列
- Prodigy™
- 产品类别
- Compound semiconductor ALD batch tool
- 尺寸
- 3500 x 2500 mm
- Max Batch Load
- 150 mm x 50 wafers, 100 mm x 75 wafers
EVG ® 610
Mask Alignment System。The is a compact and multi-purpose R&D system that can handle small substrate pieces and wafers up to 200 mm.
EVG ® 620 NT
Mask Alignment System (semi-automated / automated)。The provides state-of-the art mask alignment technology on a minimized footprint area up to 150 mm wafer s...
EVG ® 6200 NT
Mask Alignment System (semi-automated / automated)。The mask aligner is a versatile tool for optical double-side lithography and wafer sizes up to 200 mm.
LITHOSCALE ®
Maskless Exposure Lithography System。is a revolutionary, highly versatile maskless exposure lithography platform geared for a variety of microfabrication app...
LITHOSCALE ® XT
High Throughput Maskless Exposure Lithography System。is a revolutionary, highly versatile maskless exposure lithography platform geared for a variety of micr...
EVG ® 101
Advanced Resist Processing System。The perfect solution for single-wafer resist processing in R&D and small-scale production
EVG ® 105
Stand-alone EVG®105 bake module for soft- or post-exposure bake processes
EVG ® 120
Automated Resist Processing System。The is a fully automated resist processing system designed for both low-volume and high-volume manufacturing, supporting w...
EVG ® 150
Automated Resist Processing System。The is a fully-automated resist processing system providing highthroughput performance and supporting wafers up to 200 mm ...
HERCULES ®
Lithography Track System。The is a high-volume platform integrating the entire lithography process flow in one system, reducing process footprint and operator...
EVG ® 320 D2W
Automated Die Preparation and Activation System。Industry’s first commercially available hybrid bond activation and cleaning system for direct placement (DP) ...
GEMINI ® FB
Automated Collective Die-to-Wafer Bonding System。High volume manufacturing system for collective die-to-wafer (Co-D2W) bonding
HEX Mini
Download Brochure THE HEX MINI Single Source Desktop PVD Coater The HEX Mini is Korvus Technology’s compact, entry-level PVD (physical vapour deposition) sys...
- 型号或系列
- HEX Mini
- 产品类别
- Desktop PVD coater
- Maximum Sample Size (Diameter)
- 2" (50mm) Source: DC Sputtering Magnetron Sputter Size (Diameter): 2" Power Supply: 208W, 650V / 0.32A Base Pressure: <5×10-6 mbar* Chamber Volume: 3 L
- Maximum Sample Size Diameter
- 2" (50mm) Source: TES Thermal Evaporator Power Supply: 720W, 72A / 10V Base Pressure: <5×10-6 mbar* Chamber Volume: 3 L Optional Thickness Monitoring
X射线光电子能谱仪（XPS）
操作界面可在同一个屏幕内设置常规和高级的多功能测试参数，同时保留诸如进样照片导航和 SXI 二次电子影像精准定位等功能。多数量样品大面积分析 ·把制备好样品的样品托放进进样腔室后将自动传送进分析腔室内 ·可同时使用三个样品托 ·80mmx80mm 的大样品托可放置多数量样品 ·可分析粉末、粗糙表面、绝缘体、形状复...
- 型号
- PHI GENESIS 500
- 分析技术
- XPS、UPS、LEIPS、REELS、AES、GCIB
- 微区X射线束斑
- < 5um
- 样品托尺寸
- 80mmx80mm
俄歇电子能谱仪（AES）
产品特点 ·使用CMA同轴分析器，同时实现高灵敏度和高传输率。即使在低电流高空间分辨率情况下，都可轻松的进行分析。·以20kV加速电压和电流1nA进行俄歇分析，AES空间分辨率可达≤8nm
- 型号
- PHI 710
- 分析器
- CMA同轴筒镜分析仪
- 俄歇分析条件
- 20kV加速电压，电流1nA
- AES空间分辨率
- ≤8nm
LuXpector THEA
Cost-Efficient Operation: Reduced total cost of ownership (TCO) through intelligent design, modular components, and low maintenance requirements.
- Model / product family
- LuXpector THEA
- 产品类别
- Wafer Inspection / Ellipsometry
- Footprint
- 2,500 x 1,520 mm (incl. FOUPs)
- Electrical connection
- 230 V, 50-60 Hz, 2,5 kVA
SIRD SiC 200
Scanning InfraRed Depolarization。Features at a glance。Stress Measurement Quantitative stress measurement on wafer level
- Model / product family
- SIRD SiC 200
- 产品类别
- Wafer Inspection / Scanning Infrared Depolarization
- Principle
- Stress-induced optical birefringence
- Stress Sensitivity
- ≥ 0.1 kPa in-plane shear stress
SIRD
Wafer Inspection。Scanning InfraRed Depolarization。Functional Description。A robot transfers the wafer from the carrier to the measurement stage. The carrier c...
- Model / product family
- SIRD
- 产品类别
- Wafer Inspection / Scanning Infrared Depolarization
- Principle
- Stress-induced optical birefringence
- Stress sensitivity
- ≥ 0.1 kPa in-plane shear stress
Wafer Surface Measurement System
Vapor Phase Decomposition。Features at a glance。All media, from process chemicals to ICP-MS calibration, are supplied fully automatically by the system.
- Model / product family
- Wafer Surface Measurement System
- 产品类别
- Wafer Inspection / Vapor Phase Decomposition
- Wafer sizes
- 4" - 12"
- Surfaces
- Hydrophobic/hydrophilic/bevel/upper bevel
Wafer Surface Preparation System
Vapor Phase Decomposition。Features at a glance。Layout for maximum robustness against cross-contamination.
- Model / product family
- Wafer Surface Preparation System
- 产品类别
- Wafer Inspection / Vapor Phase Decomposition
- Wafer sizes
- 4" - 12"
- Surfaces
- Hydrophobic/hydrophilic/bevel/upper bevel
RIE等离子刻蚀机 Etchlab 200
低成本效 益高 RIE等离子蚀刻机Etchlab 200结合平行板等离子体源设计与直接置片。升级扩展性 根据其模块化设计，等离子蚀刻机Etchlab 200可升级为更大的真空泵组，预真空室和更多的气路。SENTECH控制软件 该等离子刻蚀机配备了用户友好的强大软件，具有模拟图形用户界面，参数窗口，工艺 编辑窗口，...
- 型号
- RIE Etchlab 200
- 产品分类
- / 等离子工艺设备 / 等离子刻蚀 / RIE等离子刻蚀机Etchlab 200 RIE Etchlab 200
- 晶片/样品尺寸
- 适用于200mm的晶片 用于激光干涉仪和OES的诊断窗口
- 晶片/样品尺寸
- 适用于4英寸到 8英寸的晶片 小片或碎片的载片器 氯基刻蚀气体
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