MicroWriter ML3 Baby 台式直写光刻机

Conventional approaches to photolithography are usually based on exposing through a chromium-glass mask manufactured by specialist vendors. In R&D environments it is often necessary to change the mask design frequently. Direct-write lithography tools (also known as digital mask aligners or maskless aligners) overcome this problem by holding the mask in software . Rather than projecting light through a physical mask, direct-write lithography uses computer-controlled optics to project the exposure pattern directly onto the photoresist.

MicroWriter ML3 Baby , MicroWriter ML3 Baby Plus and MicroWriter ML3 Mesa are compact, high-performance, low-cost direct-write optical lithography machines within the MicroWriter ML family and are designed to offer unprecedented value for money in a small laboratory footprint. Measuring only 70cm x 70cm at its base, the MicroWriter ML3 Baby sits on a standard laboratory bench or desk and plugs into a supplied laptop computer. Its only service requirement is a standard power socket. A light-excluding enclosure with safety interlock allows it to be used equally well in an open laboratory environment or in a clean room. Easy to use Windows® based software means most exposures can be set up and launched with just a few mouse clicks.

• 149mm x 149mm maximum writing area. • 155mm x 155mm x 7mm maximum wafer size. • 1µm minimum feature size across full writing area. • 405nm long-life semiconductor lightsource suitable for broadband, g- and h-line positive and negative photoresists (e.g. S1800, ECI-3000, MiR 701). Replacement 385nm and 365nm lightsources available as option, suitable for g-, h- and i-line photoresists (e.g. SU-8). Dual wavelength option (405nm lightsource and 365nm lightsource, software selectable) available for best performance across g-, h-, and i-line photoresists. • XY interferometer with 15nm resolution for precise motion control. • Fast writing speed: up to 50mm2/minute (1µm minimum feature size), allowing a typical 50mm x 50mm area to be exposed in under 1 hour. • Autofocus system using yellow light with real-time surface tracking laser– no minimum wafer size. • High quality optical microscope with Olympus infinite conjugate x10 plan objective lens and yellow light illumination for alignment to lithographic markers on the wafer (±2µm 3σ alignment accuracy). Additional x4 digital zoom can be selected in software. • Grey scale exposure mode for 3-dimensional patterning (255 grey levels). • Software API for external interfacing and control. • 100nm minimum addressable grid; 15nm sample stage resolution. • Acceptable file formats: CIF, GDS2, BMP, TIFF, JPEG, PNG, GIF. Oasis, DXF, Gerber RS-274X acceptable via KLayout conversion. • Autocalibration tool allowing users to check and correct calibration. • 2D barcodes can be automatically generated through software for exposures. The software can then identify the developed barcode patterns and reads the contents. • External dimensions: 700mm (w) x 700mm (d) x 750mm (h), excluding computer. • Light-excluding enclosure with safety interlock. • Designed for desktop use – no optical table required. • Easy to use, Windows® based control software supplied. • Supplied with KLayout open-source mask design software (www.klayout.de) • Supplied with pre-configured 64-bit Windows® 10/11 PC and monitor for ‘plug and play’ installation. • All cables supplied. • Extremely competitively priced for University and industrial R&D budgets. • Can be later upgraded to MicroWriter ML®3 Baby Plus, Mesa or Pro for higher performance. • CE-marked and compliant with EN-61010. • 90-260 VAC, 50-60Hz, 4A single phase power requirement.

MicroWriter ML3