PRO Line PVD 200 Versatile Sputtering, Electron Beam, & Thermal Evaporation Thin Film Deposition System Platform

：Automate Your Lab.

：The Kurt J. Lesker Company ® PRO Line PVD 200 is a modular, full featured thin film deposition system allowing 8" wafer transfer, up to 8 sputter cathodes and eKLipse advanced control software. With more than 500 units in service worldwide, the PVD series is a proven, robust, and versatile design consisting of the PVD 75 and 200 platforms. The PRO Line PVD 200 builds on the successes of the original design with improved system base pressures and pump down times. A technically superior chamber design, an industry best software control system with advanced programming capability, automatic substrate loading, and numerous features for optimized thin film performance are a few of the key advantages offered in this innovative, best of class design.

：Available Models

：PVD 200 Open Frame

：PVD 200 with Load Lock

：PRO Line Indium 200

：PVD200 Dual Chamber

：PVD 200 Dual Chamber

：Specifications

：Box Chamber, 304 Stainless Steel Chamber

：Internal Dimension Options:

：For Sputtering or Shorter Throw Evaporation/E-Beam: 19.25" Wide x 20.5" Deep x 24" High (488.95mm Wide x 520.7mm Deep x 609.6mm High) Aluminum, O-Ring Sealed, Hinged, Front Access Door

：For Sputtering Applications or Long Throw Evaporation/E-Beam: 19.25" Wide x 20.5" Deep x 36" High (488.95mm Wide x 520.7mm Deep x 914.4mm High) Aluminum, O-Ring Sealed, Hinged, Front Access Door

：Deposition Techniques

：Thermal Evaporation

：Up to Six 4" Individual Boats

：TORUS Magnetron Sputtering Sources

：Up to Eight 2" or 3" Sources

：Electron Beam Evaporation Source

：4 Pocket 8cc

：8 Pocket 12cc

：6 Pocket 20cc