Raith EBPG - Highest throughput, automation, and precision
EBPG
Robust 100 kV column technology。：High-resolution lithography below 5 nm。：Automated wafer and multi-sample exposures
广西科米瑞实验仪器设备有限公司提供 Raith EBPG 产品资料、选型咨询、供货报价和售后服务支持，价格面议。
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说明
：Introduction
：Key features
：Robust 100 kV column technology
：High-resolution lithography below 5 nm
：Automated wafer and multi-sample exposures
：Automated exposure parameter switching and calibration, allowing seamless and stable switching between high throughput (highest beam current 350 nA) and high resolution mode
：World’s best overlay accuracy
：Extremely fast stage with very low settling times
：Automated 2- or 10-holder airlock
：Fast and error-free sample alignment
：Advanced fracturing modes (shapes) for lowest line-edge roughness and highest pattern fidelity
：Highly efficient data processing
：Easy-to-learn graphical user interface and terminal interface for scripting
：Secure multi-user environment with different access levels
：The holistic EBPG design meets the diverse performance requirements for advanced nanolithography
：Maximum throughput
：Unrivaled precision
：Seamless integration and scalability
：Perfect
：Shapes
：Positioning
：Software – Digital RAITH Beams
：All you need as an interface for professional electron beam lithography
：Overall graphical interface Cebpg
规格
| 技术参数 | Robust 100 kV column technology |
|---|---|
| 技术参数 | High-resolution lithography below 5 nm |
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