NEXUS IBE Ion Beam Etch System
Unsurpassed Uniformity over Multiple Energy and Process Angles
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：Maximize slider yields and achieve excellent ion beam etch uniformity with the NEXUS® IBE™ Ion Beam Etching System. The IBE System offers unsurpassed uniformity over a wide range of energy and process angles, making it ideal for etch depth control of next-generation ABS step and cavity processing.
：Superior uniformity and improved etch depth control
：Highest throughput and reduced footprint for lowest cost of ownership
：Easily integrates with common technologies on world-class NEXUS hardware and software platform
：NEXUS Ion Source improves etch uniformity and process repeatability
：Also available with RF350 source for operations that have process-qualified use of RF350 source
：Platform can be cost-effectively field-upgraded to NEXUS Ion Source
| 型号 | NEXUS IBE Ion Beam Etch System |
|---|---|
| 产品类别 | Ion Beam Etch System |
| Application | RF350 source for operations that have process-qualified use of RF350 source Platform can be cost-effec |
| Technology | ion beam etch uniformity with the NEXUS® IBE™ Ion Beam Etching System |
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