NEXUS PVDi Physical Vapor Deposition System
Flexible Deposition Platform Serves Wide Range of Applications
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：Veeco’s single-target NEXUS PVDi Physical Vapor Deposition System offers maximum flexibility for a wide range of thin film deposition applications. The NEXUS PVD is 200mm capable and features advanced process capabilities, unsurpassed uniformity and multiple deposition modes.
：Unsurpassed reliability and uniformity helps boost process yields
：Higher throughput and uptime for lower cost of ownership
：NEXUS platform integrates with a broad range of Veeco technologies, such as ion beam deposition, ion beam etch and atomic layer deposition
| 型号 | NEXUS PVDi Physical Vapor Deposition System |
|---|---|
| 产品类别 | Ion Beam Etch System |
| Technology | Physical Vapor Deposition System offers maximum flexibility for a wide range of thin film deposition applications |
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