TOPAS-PRIME 共线光学参量放大器
189 nm – 20 μm 可调波长。TOPAS-PRIME 是一款专为钛蓝宝石激光器设计的共线式飞秒光学参量放大器（OPA）。可接受的泵浦脉冲能量高达 3.5 mJ（脉宽 20 – 60 fs），或高达 4 mJ（脉宽 60 – 200 fs）
- 型号
- TOPAS-PRIME
- 产品分类
- CRONUS-3P
- 型号
- TOPAS‑PRIME / TOPAS‑PRIME‑PLUS
- 输入波长
- 770 – 830 nm
TOPAS-TWINS 双独立光学参量放大器
每个通道调谐范围 240 nm – 20 μm。TOPAS-TWINS 是一款双光学参量放大器（OPA），由两个独立可调谐的 OPA 集成于单一外壳中。这两个 OPA 共用同一白光光源，可提供卓越的输出稳定性，并在 4.5 – 15 μm 的调谐范围内输出 CEP 稳定的中红外脉冲
- 型号
- TOPAS-TWINS
- 产品分类
- CRONUS-3P
- OPA 通道
- OPA-1 / OPA-2
- 输入波长
- 770 – 830 nm
Magnitude Instruments AMP200-SIPD 200 MHz 放大硅光电探测器
AMP200-SIPD 是 200 MHz 放大硅光电探测器，用于稳态和时间分辨测量，Si 二极管覆盖 250-1100 nm 光谱范围。
- 型号或产品编号
- AMP200-SIPD
- 产品类别
- Amplified photodetector
- External Dimensions
- 43.2 mm (L) x 19.2 mm (W) x 68.6 mm (H)
- 电源电压
- Linear 12 VDC
Magnitude Instruments AMP200-IGAPD-1.7 200 MHz 放大 InGaAs 光电探测器
AMP200-IGAPD-1.7 是 200 MHz 放大 InGaAs 光电探测器，用于稳态和时间分辨测量，InGaAs 二极管覆盖 800-1700 nm 光谱范围。
- 型号或产品编号
- AMP200-IGAPD-1.7
- 产品类别
- Amplified photodetector
- External Dimensions
- 43.2 mm (L) x 19.2 mm (W) x 68.6 mm (H)
- 电源电压
- Linear 12 VDC
Flex.Braze
Compact. Efficient. Reliable.。Metal-heated high-vacuum brazing furnace, optionally available with a flexible process gas supply. Thanks to its modular frame ...
- Model / product family
- Flex.Braze
- 产品类别
- Brazing
- Charge weight max. [kg]
- 100
- Workpiece dimensions max. (WxHxD) [mm]
- 350 x 350 x 500
Lab.Braze
Small. Movable. Precise.。Metal-heated high-vacuum brazing furnace for small batches and highest demands for temperature uniformity. The furnace is very easy ...
- Model / product family
- Lab.Braze
- 产品类别
- Brazing
- Charge weight max. [kg]
- 80
- Workpiece dimensions max. (WxHxD) [mm]
- 250 x 250 x 400
VI.Braze
Big. Fast. Clean.。Metal-heated high-vacuum brazing furnace for highest vacuum levels and ready for wall-integration. Thanks to its vacuum-tight design and la...
- Model / product family
- VI.Braze
- 产品类别
- Brazing
- Charge weight max. [kg]
- 1,400
- Workpiece dimensions max. (WxHxD) [mm]
- 1,000 x 1,000 x 1,200
CVD Reactor
Chemical Vapor Deposition and Infiltration。Chemical Vapor Deposition。Material Solutions
- Model / product family
- CVD Reactor
- 产品类别
- Chemical Vapor Deposition And Infiltration / Chemical Vapor Deposition
- Available chamber diameter (mm)
- 600, 900, 1,200, 1,600, 2,500
- Max. temperature (°C)
- 1,600 (option 2,200)
CVI Systems
Chemical Vapor Deposition and Infiltration。Chemical Vapor Infiltration。Material Solutions
- Model / product family
- CVI Systems
- 产品类别
- Chemical Vapor Deposition And Infiltration / Chemical Vapor Infiltration
- Available chamber diameter (mm)
- 600, 900, 1,200, 1,600, 2,500
- Max. temperature (°C)
- 1,600 (option 2,200)
Fluidized Bed Reactors
Chemical Vapor Deposition and Infiltration。Fluidized Bed Process。Fluidized Bed Reactor System
- Model / product family
- Fluidized Bed Reactors
- 产品类别
- Chemical Vapor Deposition And Infiltration / Fluidized Bed Process
- Available chamber diameter (inches)
- 1.5, 2, 3, 5, 6, 7
- Max temperature (°C)
- 1,900
CGS1218
Crystal Growth。Czochralski Process。Advanced Automation。Advanced automation with PLC control, recipe management, camera-based diameter monitoring, and safety ...
- Model / product family
- CGS1218
- 产品类别
- Crystal Growth / Czochralski Process
- Max. ingot diameter
- 12" - 18"
- Ingot length
- 2,800 mm
SC-Line
Crystal Growth。Czochralski Process。Additional Features。Customized options include various magnetic lift concepts (magnetic lift up to ~16 tons) for different...
- Model / product family
- SC-Line
- 产品类别
- Crystal Growth / Czochralski Process
- Max. ingot diameter
- 12" - 18"
- Max. ingot length
- Up to 3,600 mm
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