中文English
科米瑞
首页联系我们
  1. 首页
  2. 产品中心
  3. 产品目录
  4. 分页
  5. 第 223 页
科米瑞

© Copyright 科米瑞 2026

产品中心产品目录应用领域知识中心常见问题联系我们隐私政策桂ICP备2020008265号-5
广西科米瑞实验仪器设备有限公司13422079856122816084@qq.com
分析检测仪器生命科学仪器显微成像与光学样品前处理温控加热与制冷真空泵阀与流体科米瑞仪器应用领域实验室仪器选型

型号索引

产品目录

按产品分类和分页展示全部上架产品,便于按型号、图片和技术参数继续查看详情。

返回产品中心站内搜索型号
筛选产品按仪器类型、品牌或型号快速定位。
-

一级产品分类

全部产品11357
分析检测仪器407

色谱、质谱、光谱、电化学与理化分析

查看该类产品
八通道电化学工作站
半导体晶圆检测系统
半导体与平板显示器检测显微镜
另有 404 类,进入后查看
生命科学仪器64

细胞、分子、生物制药、培养与成像

查看该类产品
八通道毛细管电泳系统
单细胞分液仪
低温培养箱
另有 61 类,进入后查看
显微成像与光学86

显微镜、成像系统、光学平台与光学测量

查看该类产品

广西科米瑞实验仪器设备有限公司 · 第 223 / 474 页 · 共 11357 条

上一页
1
...222
223
224
...474
下一页
倒置成像显微镜
倒置金相显微镜
倒置研究显微镜
另有 83 类,进入后查看
样品前处理36

消解、萃取、浓缩、纯化、研磨与进样

查看该类产品
冲击式采样器
吹扫捕集系列
吹扫捕集自动进样器
另有 33 类,进入后查看
温控加热与制冷56

加热、恒温、干燥、制冷、水浴、烘箱与培养箱

查看该类产品
低温泵
低温恒温槽系列
低温灭菌器
另有 53 类,进入后查看
真空泵阀与流体38

真空系统、泵、阀、气体、流量与液体处理

查看该类产品
96通道电动移液器
便携式蠕动泵
单级油封旋片泵
另有 35 类,进入后查看
材料物性与力学17

材料表征、热分析、力学、粒度、表面和物性测试

查看该类产品
万能材料试验机
在线粘度计
HI719-镁 Mg 硬度比色计-汉钠仪器(上海)有限公司
另有 14 类,进入后查看
环境安全与现场检测15

环境监测、安全防护、气溶胶、辐射与现场仪器

查看该类产品
安全称量站
安全储存柜
安全防护箱体
另有 12 类,进入后查看
实验室通用设备33

天平、搅拌、摇床、清洗、灭菌、工作台和常规设备

查看该类产品
半微量天平
大容量方腔高压灭菌器
光纤熔接拉锥工作台
另有 30 类,进入后查看
电子电工与半导体17

半导体、电子测量、电源、电池、探针台与微纳加工

查看该类产品
多通道电池测试系统
俄歇电子能谱仪(AES)
化合物半导体沉积系统
另有 14 类,进入后查看
实验室工程与配套22

实验室工程、配套系统、家具、管路与辅助系统

查看该类产品
定制飞秒激光微加工工作站
动物废弃物工作站
动物换笼工作站
另有 19 类,进入后查看
其他专用仪器253

覆盖更多实验室专项设备

查看该类产品
传感器
创新型钳形表
刺入式温度计
另有 250 类,进入后查看

没有找到合适型号?

提交选型需求

全部产品目录

全部分析检测仪器生命科学仪器显微成像与光学样品前处理温控加热与制冷真空泵阀与流体材料物性与力学环境安全与现场检测实验室通用设备电子电工与半导体
KV1000 Kinematic Viscosity Bath
petroleum and laboratory test instrumentsKoehler Instrument型号 KV1000 Kinematic Viscosity Bath

KV1000 Kinematic Viscosity Bath

Kinematic viscosity is of primary importance in the design and selection of a wide range of petroleum products. Calibrated capillary viscometers are used to ...

参数
Kinematic viscosity is of primary importance in the design and selection of a wide range of petroleum products. Calibrated capillary viscometers are used to measure flow under gravity or vacuum at precisely controlled temperatures.
参数
Variable temperature limit control
参数
Conforms to ASTM D445 and related specifications
参数
Constant temperature bath for kinematic viscosity testing of petroleum products. Accommodates six round 2" (51mm) diameter viscometer holders. Bath temperature stability of ± 0.02 °C as per ASTM requirements. Test temperatures of up to 150°C (302°F)
查看详情
HKV4000 High Temperature Kinematic Viscosity Bath with Integrated Digital Timing
petroleum and laboratory test instrumentsKoehler Instrument型号 KV4000 Kinematic Viscosity Bath with Integrated Digital Timing

KV4000 Kinematic Viscosity Bath with Integrated Digital Timing

Kinematic viscosity is of primary importance in the design and selection of a wide range of petroleum products. Calibrated capillary viscometers are used to ...

参数
Kinematic viscosity is of primary importance in the design and selection of a wide range of petroleum products. Calibrated capillary viscometers are used to measure flow under gravity or vacuum at precisely controlled temperatures.
参数
Microprocessor temperature control between ambient and 150 °C (302 °F)
参数
Dual digital displays show setpoint and actual bath temperature
参数
Selectable temperature scale - Fahrenheit or Celsius
查看详情
Thin film deposition system familyKorvus Technology型号 HEX Series Thin Film Deposition Systems

HEX Series Thin Film Deposition Systems

The HEX Series offers a unique level of modularity for a thin film deposition system, which can be modified easily to suit the application.

型号或系列
HEX Series Thin Film Deposition Systems
产品类别
Thin film deposition system family
Maximum Sample Size Diameter
4" (100mm) Deposition Sources: Up to 3 Magnetron Sputter Size (Diameter): 2" Chamber Volume: 12 L - (24 L When Stacked) Base Pressure: 5×10-7 mbar*
Maximum Sample Size Diameter
6" (150mm) Deposition Sources: Up to 6 Magnetron Sputter Size (Diameter): 2" or 3" Chamber Volume: 50L - (100L When Stacked) Base Pressure: <5×10-7 mbar*
查看详情
HEX, HEX-L and HEX-XL Highly Modular PVD Systems
Highly modular PVD systemKorvus Technology型号 HEX, HEX-L and HEX-XL Highly Modular PVD Systems

HEX, HEX-L and HEX-XL Highly Modular PVD Systems

The HEX Series Download Brochure THE HEX SERIES The open frame design of our systems is the bedrock upon which the flexibility of the HEX series is built. No...

型号或系列
HEX, HEX-L and HEX-XL Highly Modular PVD Systems
产品类别
Highly modular PVD system
Maximum Sample Size Diameter
4" (100mm) Deposition Sources: Up to 3 Magnetron Sputter Size (Diameter): 2" Chamber Volume: 12 L - (24 L When Stacked) Base Pressure: 5×10-7 mbar*
Maximum Sample Size Diameter
6" (150mm) Deposition Sources: Up to 6 Magnetron Sputter Size (Diameter): 2" or 3" Chamber Volume: 50L - (100L When Stacked) Base Pressure: <5×10-7 mbar*
查看详情
HEX Steel
Stainless steel chamber PVD systemKorvus Technology型号 HEX Steel

HEX Steel

The HEX Steel thin film deposition system is a steel version of the standard aluminium HEX chamber, offerings the same modularity but with different properties.

型号或系列
HEX Steel
产品类别
Stainless steel chamber PVD system
查看详情
HEX Cluster
Cluster PVD systemKorvus Technology型号 HEX Cluster

HEX Cluster

The HEX Cluster PVD cluster system allows all the standard modularity benefits of the HEX series in a cluster design, offering inmatched flexibility.

型号或系列
HEX Cluster
产品类别
Cluster PVD system
查看详情
Desktop PVD coaterKorvus Technology型号 HEX Mini

HEX Mini

Download Brochure THE HEX MINI Single Source Desktop PVD Coater The HEX Mini is Korvus Technology’s compact, entry-level PVD (physical vapour deposition) sys...

型号或系列
HEX Mini
产品类别
Desktop PVD coater
Maximum Sample Size (Diameter)
2" (50mm) Source: DC Sputtering Magnetron Sputter Size (Diameter): 2" Power Supply: 208W, 650V / 0.32A Base Pressure: <5×10-6 mbar* Chamber Volume: 3 L
Maximum Sample Size Diameter
2" (50mm) Source: TES Thermal Evaporator Power Supply: 720W, 72A / 10V Base Pressure: <5×10-6 mbar* Chamber Volume: 3 L Optional Thickness Monitoring
查看详情
Ultra-high vacuum electron beam evaporation systemKorvus Technology型号 TAU UHV 4 Pocket Mini E Beam Evaporator

TAU UHV 4 Pocket Mini E Beam Evaporator

4 Pocket Mini Electron-Beam Source Sequential or Co-Evaporation Flux Monitoring Electrodes Water-Cooled From CF63 Mounting Flange 250C Bakeout Temperature Up...

型号或系列
TAU UHV 4 Pocket Mini E Beam Evaporator
产品类别
Ultra-high vacuum electron beam evaporation system
TAU UHV
4 Pocket Mini E Beam Evaporator
The TAU UHV Mini
4 Pocket Electron Beam Evaporator
查看详情
NANO 36™ Affordable, Compact Sputtering or Thermal Evaporation Thin Film Deposition System
Sputtering SystemKurt J. Lesker型号 NANO 36

NANO 36™ Affordable, Compact Sputtering or Thermal Evaporation Thin Film Deposition System

Automate Your Lab.。:The Kurt J. Lesker Company® NANO 36™ is our optimized, entry level deposition system. Our chamber design is uniquely suited for glovebox ...

型号
NANO 36
Product category
Sputtering System
技术参数
The NANO 36 is compatible with the following deposition techniques:
技术参数
Thermal Evaporation (up to four 2" boat assemblies).
查看详情
ALTOSONIC V12
超声波流量计KROHNE型号 ALTOSONIC V12

ALTOSONIC V12

气体超声波流量计,用于天然气、氢气和其他气体的贸易交接(CT)流量测量。遵循 AGA、ISO 17089-1、AGA 9、OIML R137 class 0.5、MI-002 等标准 适用于各种气体 — 从天然气、混合气体到纯氢 用于检测底部污垢的专用诊断声道 口径从 DN100 / 4" 到 DN750 / 30"

查看详情
PRO Line PVD 75 Versatile Sputtering, Electron Beam, & Thermal Evaporation Thin Film Deposition System Platform
Sputtering SystemKurt J. Lesker型号 PRO Line PVD 75

PRO Line PVD 75 Versatile Sputtering, Electron Beam, & Thermal Evaporation Thin Film Deposition System Platform

Automate Your Lab.。:The Kurt J. Lesker Company ® PRO Line PVD 75 is the next generation thin film deposition system based on the workhorse PVD 75 platform. W...

型号
PRO Line PVD 75
Product category
Sputtering System
KL-6 Electron Beam source
100mm Wafer / <=+/-4%
KL-6 Electron Beam source
150mm Wafer / <=+/-5%
查看详情
水分析仪表板
多参数测量系统KROHNE型号 水分析仪表板

水分析仪表板

灵活地选择所需参数:溶解氧、浊度、电导率、pH/ORP 安装紧凑的分析模块:所有测量点在同一位置 完全预布线和预组装,便于旁路安装。灵活地选择所需参数:溶解氧、浊度、电导率、pH/ORP

查看详情
PRO Line PVD 200 Versatile Sputtering, Electron Beam, & Thermal Evaporation Thin Film Deposition System Platform
Sputtering SystemKurt J. Lesker型号 PRO Line PVD 200

PRO Line PVD 200 Versatile Sputtering, Electron Beam, & Thermal Evaporation Thin Film Deposition System Platform

Automate Your Lab.。:The Kurt J. Lesker Company ® PRO Line PVD 200 is a modular, full featured thin film deposition system allowing 8" wafer transfer, up to 8...

型号
PRO Line PVD 200
Product category
Sputtering System
KL-6 Electron Beam Source
Up to 200mm Wafer / <=+/-5%
KL-8 Electron Beam Source
Up to 200mm Wafer / <=+/-5%
查看详情
OPTIFLUX 1400
电磁流量计KROHNE型号 OPTIFLUX 1400

OPTIFLUX 1400

电磁流量计,适用于配比系统、紧凑橇装和无线现场核查的需求。多相流工况运行(Multi Phase Operation,MPO):即使在发生气体夹带和固体杂质等显著工艺干扰时,依然实现连续测量,并提供稳定、可重复的读数 通过 Bluetooth ® 蓝牙进行参数设置、监测与核查 夹持型结构:DN10...150 /...

查看详情
OPTIFLUX 2400
电磁流量计KROHNE型号 OPTIFLUX 2400

OPTIFLUX 2400

电磁流量计,适用于高端的水和污水应用以及无线现场核查的需求。集成快速响应的电导率测量功能,用于监测水质问题和空管事件 多相流工况运行(Multi Phase Operation,MPO):即使在发生气体夹带和固体杂质等显著工艺干扰时,依然实现连续测量,并提供稳定、可重复的读数 通过 Bluetooth ® 蓝牙进...

查看详情
AXXIS Co-Sputtering, Thermal Evaporation, & Electron Beam Techniques
Sputtering SystemKurt J. Lesker型号 AXXIS

AXXIS Co-Sputtering, Thermal Evaporation, & Electron Beam Techniques

AXXIS™ - Facilitates multiple deposition techniques and co-deposited films efficiently!

型号
AXXIS
Product category
Sputtering System
技术参数
AXXIS™ - Facilitates multiple deposition techniques and co-deposited films efficiently!
技术参数
The University of Alberta uses our AXXIS for glancing angle depositions (GLAD).
查看详情
Mini SPECTROS Deposition & Metallization System up to 100mm x 100mm Substrate
Thin Film Deposition SystemKurt J. Lesker型号 Mini SPECTROS

Mini SPECTROS Deposition & Metallization System up to 100mm x 100mm Substrate

Automate Your Lab.。:The Kurt J. Lesker Company ® Mini SPECTROS™ is the next generation thin film deposition system based on the workhorse SPECTROS platform. ...

型号
Mini SPECTROS
Product category
Thin Film Deposition System
Thermal Evaporation Source
100mm x 100mm / <=+/-5%
KL-6 Electron Beam source
100mm x 100mm / <=+/-5%
查看详情
WATERFLUX 3400
电磁流量计KROHNE型号 WATERFLUX 3400

WATERFLUX 3400

电磁流量计,适用于无前后直管段的高端水处理应用(0D/0D)。集成快速响应的电导率测量功能,用于监测水质问题和空管事件 多相流工况运行(Multi Phase Operation,MPO):即使在发生气体夹带和固体杂质等显著工艺干扰时,依然实现连续测量,并提供稳定、可重复的读数 通过 Bluetooth ® 蓝牙...

查看详情
SPECTROS™ 150 Organic Thin Film Deposition & Metallization System up to 150mm x 150mm Substrate
Thin Film Deposition SystemKurt J. Lesker型号 SPECTROS 150

SPECTROS™ 150 Organic Thin Film Deposition & Metallization System up to 150mm x 150mm Substrate

Automate Your Lab.。:The Kurt J. Lesker Company ® SPECTROS™ 150 is the next generation thin film deposition system based on the workhorse SPECTROS platform. W...

型号
SPECTROS 150
Product category
Thin Film Deposition System
Pump
Torr / mbar
790l/s Turbopump
9.0E-07 / 1.2E-06
查看详情
OPTIFLUX 4400
电磁流量计KROHNE型号 OPTIFLUX 4400

OPTIFLUX 4400

电磁流量计,适用于安全仪表系统 (SIS)、高端工艺和无线现场核查的应用。可自动进行部分验证测试,延长 SIL 应用中的测试时间间隔 多相流工况运行(Multi Phase Operation,MPO):即使在发生气体夹带和固体杂质等显著工艺干扰时,依然实现连续测量,并提供稳定、可重复的读数 通过 Bluetoo...

查看详情
Super-SPECTROS™ 200 Organic Thin Film Deposition & Metallization System up to 200mm x 200mm Substrate
Thin Film Deposition SystemKurt J. Lesker型号 Super-SPECTROS 200

Super-SPECTROS™ 200 Organic Thin Film Deposition & Metallization System up to 200mm x 200mm Substrate

Automate Your Lab.。:Optimized for organic material deposition。:Up to 12 LTE sources

型号
Super-SPECTROS 200
Product category
Thin Film Deposition System
技术参数
Optimized for organic material deposition
技术参数
Up to 4 thermal evaporation sources
查看详情
OPTIFLUX 5400
电磁流量计KROHNE型号 OPTIFLUX 5400

OPTIFLUX 5400

电磁流量计,适用于严苛工艺、计量标准表和无线现场核查的应用。高精度(±0.15% MV),采用陶瓷测量管;适用于腐蚀性、研磨性,以及高含固量的液体和悬浮液,温度最高可达 +180°C / +356°F 多相流工况运行(Multi Phase Operation,MPO):即使在发生气体夹带和固体杂质等显著工艺干扰...

查看详情
OCTOS™ Automated Thin Film Deposition Cluster Tool
Automated Thin Film Deposition Cluster ToolKurt J. Lesker型号 OCTOS

OCTOS™ Automated Thin Film Deposition Cluster Tool

Automate Your Lab.。:The Kurt J. Lesker Company ® OCTOS cluster tools are proven R&D and pilot production systems for in vacuum transfer between multiple proc...

型号
OCTOS
Product category
Automated Thin Film Deposition Cluster Tool
技术参数
The Kurt J. Lesker Company ® OCTOS cluster tools are proven R&D and pilot production systems for in vacuum transfer between multiple process chambers.
技术参数
Process chambers are arranged around a central robotic distribution chamber to suit your application.
查看详情
OPTIFLUX 6400
电磁流量计KROHNE型号 OPTIFLUX 6400

OPTIFLUX 6400

电磁流量计,适用于高端的卫生型应用以及无线现场核查的需求。用于食品和饮料 — 从软饮料、牛奶到浓缩果汁的精确流量测量和配比 多相流工况运行(Multi Phase Operation,MPO):即使在发生气体夹带和固体杂质等显著工艺干扰时,依然实现连续测量,并提供稳定、可重复的读数 通过 Bluetooth ® ...

查看详情

第 223 / 474 页