产品目录第 346 页

Ion Beam Etch SystemVeeco型号 NEXUS IBE Ion Beam Etch System

NEXUS IBE Ion Beam Etch System

Unsurpassed Uniformity over Multiple Energy and Process Angles

型号: NEXUS IBE Ion Beam Etch System
产品类别: Ion Beam Etch System
Application: RF350 source for operations that have process-qualified use of RF350 source Platform can be cost-effec
Technology: ion beam etch uniformity with the NEXUS® IBE™ Ion Beam Etching System

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Ion Beam Etch SystemVeeco型号 NEXUS DLC-X Diamond-Like Carbon System

NEXUS DLC-X Diamond-Like Carbon System

Ultra-Hard, Corrosion-Resistant TFMH Coating Film Technology

型号: NEXUS DLC-X Diamond-Like Carbon System
产品类别: Ion Beam Etch System
Technology: ion beam etch source results in stable operation down from 75 volt to 300 volt beam energies Tilting ellipsometer

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Ion Beam Etch SystemVeeco型号 NEXUS PVDi Physical Vapor Deposition System

NEXUS PVDi Physical Vapor Deposition System

Flexible Deposition Platform Serves Wide Range of Applications

型号: NEXUS PVDi Physical Vapor Deposition System
产品类别: Ion Beam Etch System
Technology: Physical Vapor Deposition System offers maximum flexibility for a wide range of thin film deposition applications

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Dicing and Lapping SystemVeeco型号 Optium ADS-800 Advanced Dicing System

Optium ADS-800 Advanced Dicing System

Delivers High Productivity Dicing Solutions for a Broad Range of Applications

型号: Optium ADS-800 Advanced Dicing System
产品类别: Dicing and Lapping System
Application: rformance air bearing spindle for smooth, precise motion result in superior and repeatable cut quality

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Dicing and Lapping SystemVeeco型号 Optium ASL-200 Advanced Lapping System

Optium ASL-200 Advanced Lapping System

：：For Exceptional Control of TFMH Performance Characteristics ：Achieve new levels of control and TFMH process yields wi...

型号: Optium ASL-200 Advanced Lapping System
产品类别: Dicing and Lapping System
Application: rformance Characteristics Achieve new levels of control and TFMH process yields with Veeco’s Optium® A

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Atomic layer deposition systemVeeco型号 Phoenix

Phoenix – Batch Production ALD

Production Capabilities。：The Phoenix® system is engineered for high throughput and maximum uptime in any fabrication environment, from pilot production to in...

型号: Phoenix
产品类别: Atomic Layer Deposition System

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MOCVD SystemVeeco型号 Piezocon

Piezocon Gas Concentration Sensor

The Industry Standard for Reproducible Vapor Delivery Control The Piezocon® Gas Concentration Sensor has become the industry standard among semiconductor man...

型号: Piezocon
产品类别: MOCVD System
Technology: MOCVD process tools

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MOCVD SystemVeeco型号 Propel 300mm GaN MOCVD System for 5G

Propel 300mm GaN MOCVD System for 5G, Photonics and CMOS

Fully Automated, Single Wafer Cluster System Enables Production 5G RF, Photonics and advanced CMOS Devices on 300mm Substrates.

型号: Propel 300mm GaN MOCVD System for 5G
产品类别: MOCVD System
Application: 5G RF, Photonics and advanced CMOS Devices on 300mm Substrates
Technology: MOCVD tool that enables production of 5G RF, Photonic and advanced CMOS devices on 300mm substrates

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MOCVD SystemVeeco型号 Propel HVM GaN MOCVD System for Power

Propel HVM GaN MOCVD System for Power, 5G RF and Photonics

Single-Wafer Reactor Technology Enables Efficient and High-Quality, GaN-Based Devices for Power, 5G RF and Photonics Applications

型号: Propel HVM GaN MOCVD System for Power
产品类别: MOCVD System
Application: 5G RF and Photonics Applications Veeco’s Propel™ HVM GaN MOCVD System is designed as a unique, high vo
Technology: MOCVD System is designed as a unique, high volume manufacturing single wafer reactor cluster system for G

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MOCVD SystemVeeco型号 Propel GaN MOCVD System for R

Propel GaN MOCVD System for R&D and Production

Built on Veeco’s Proven TurboDisc Technology to Accelerate Process Development for Next Generation Devices

型号: Propel GaN MOCVD System for R
产品类别: MOCVD System
Technology: MOCVD tool on a 200mm (8”) Silicon substrate

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Optical Coating MonitorVeeco型号 Quest

Quest Broadband Optical Monitor for Optical Coating Manufacturers

Precision Control of Layer Endpoints Results in Improved Repeatability and Exceptional Process Control

型号: Quest
产品类别: Optical Coating Monitor
Application: rface Fully integrates into existing SPECTOR and SPECTOR-HT IBD systems

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Atomic layer deposition systemVeeco型号 Savannah

Savannah – Thermal ALD for R&D

Advanced Capabilities for Advanced Research。：Veeco is the leading provider of atomic layer deposition (ALD) systems for research and industry worldwide, deli...

型号: Savannah
产品类别: Atomic Layer Deposition System
Wafer size: up to 300mm for the S300)
Technology: atomic layer deposition (ALD) systems for research and industry worldwide, delivering comprehensive services and versatile,

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Ion Beam Deposition SystemVeeco型号 SPECTOR Ion Beam Deposition Sputtering for Optical Coating

SPECTOR Ion Beam Deposition Sputtering for Optical Coating

Turn-Key Manufacturing for Precision Optical Thin Films Achieve greater precision and thin film process flexibility with Veeco’s SPECTOR® Ion Beam Sputtering...

型号: SPECTOR Ion Beam Deposition Sputtering for Optical Coating
产品类别: Ion Beam Deposition System
Application: Optical Coating System

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Ion Beam Deposition SystemVeeco型号 SPECTOR Large Area Ion Beam Deposition System for Optical Coating

SPECTOR Large Area Ion Beam Deposition System for Optical Coating

Increased Throughput and Excellent Material Uniformity。：Veeco’s SPECTOR® Large Area Planetary Ion Beam Deposition System combines unsurpassed ion beam film q...

型号: SPECTOR Large Area Ion Beam Deposition System for Optical Coating
产品类别: Ion Beam Deposition System
Wafer size: up to 400mm in diameter and 100mm thick
Application: RF high-power deposition source and ultra-low contamination RF neutralizers to ensure high deposition

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MOCVD SystemVeeco型号 TurboDisc EPIK 868

TurboDisc EPIK 868 MOCVD System for LED Production

Leading-Edge Performance with Maximum Capital Efficiency & Footprint Savings

型号: TurboDisc EPIK 868
产品类别: MOCVD System
Application: rformance with Maximum Capital Efficiency & Footprint Savings Veeco’s EPIK® 868 is the LED industry’s
Technology: MOCVD system that enables superior uniformity and repeatability with low defectivity

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Wet Processing PlatformVeeco型号 WaferEtch

WaferEtch Wet Processing Platform

WaferChek Endpoint – Optical endpoint enables accurate identification of etch endpoint to minimize undercut, improve throughput, and lower chemistry cost.

型号: WaferEtch
产品类别: Wet Processing Platform
Application: rformance requirements become more stringent, the RDL line/space dimensions continue to shrink

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Wet Processing PlatformVeeco型号 WaferStorm

WaferStorm Wet Processing Platform

The WaferStorm platform is the industry choice for a number of critical solvent-based processes in the advanced packaging, MEMs, RF, Data Storage and Photoni...

型号: WaferStorm
产品类别: Wet Processing Platform
Application: RF, Data Storage and Photonics markets

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BOD/呼吸计VELP Scientifica型号 BMP

RESPIROMETRIC 传感器系统 6 Maxi - BMP

BMP测试的理想解决方案易用且功能强大明亮的4位数LED显示屏确保了市场上其他传感器的长电池寿命。压力范围：500-2000mbar(hPa)。压力范围：500÷2000mbar (hPa)

RESPIROMETRIC 传感器系统: 6 Maxi - BMP
压力范围: 500-2000mbar(hPa)。压力范围：500÷2000mbar (hPa)。
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BOD/呼吸计VELP Scientifica型号 BOD

呼吸传感器系统6--生化需氧量传感器

生化氧测定 BOD 易用且功能强大明亮的4位数LED显示屏确保了市场上其他传感器的长电池寿命。压力范围：500-2000mbar(hPa)。压力范围：500÷2000mbar (hPa)

压力范围: 500-2000mbar(hPa)。压力范围：500÷2000mbar (hPa)。
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BOD/呼吸计VELP Scientifica型号 RESPIROMETRIC SENSOR SYSTEM PLASTIC

用于塑料生物降解性的RESPIROMETRIC传感器系统6。

易用且功能强大多重搅拌器数字6位，可精确设置搅拌速度，并实现锁定功能，避免无意中修改搅拌速度。压力范围：500 ÷ 2000 mbar (h) 500÷2000毫巴（hPa）

压力范围: 500 ÷ 2000 mbar (h) 500÷2000毫巴（hPa）。
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BOD/呼吸计VELP Scientifica型号 SDS

ECODryBlock

为您的应用量身定制恒温培养与样品制备 ——包括DNA/RNA提取与纯化、酶促反应及细胞培养活化变性分析与检测准备 ——涵盖DNA与蛋白质变性、SDS-PAGE样品制备、血清研究、免疫检测，以及凝血检测、血尿素氮测定等临床检验与原位杂交实验物化特性研究 ——熔点与沸点测定、培养基测试及其他分析实验凭借其高达...

分辨率为: 0.5 °C
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