产品目录第 11 页

Ultra-high vacuum electron beam evaporation systemKorvus Technology型号 TAU UHV 4 Pocket Mini E Beam Evaporator

TAU UHV 4 Pocket Mini E Beam Evaporator

4 Pocket Mini Electron-Beam Source Sequential or Co-Evaporation Flux Monitoring Electrodes Water-Cooled From CF63 Mounting Flange 250C Bakeout Temperature Up...

型号或系列: TAU UHV 4 Pocket Mini E Beam Evaporator
产品类别: Ultra-high vacuum electron beam evaporation system
TAU UHV: 4 Pocket Mini E Beam Evaporator
The TAU UHV Mini: 4 Pocket Electron Beam Evaporator

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Sputtering SystemKurt J. Lesker型号 NANO 36

NANO 36™ Affordable, Compact Sputtering or Thermal Evaporation Thin Film Deposition System

Automate Your Lab.。：The Kurt J. Lesker Company® NANO 36™ is our optimized, entry level deposition system. Our chamber design is uniquely suited for glovebox ...

型号: NANO 36
Product category: Sputtering System
技术参数: The NANO 36 is compatible with the following deposition techniques:
技术参数: Thermal Evaporation (up to four 2" boat assemblies).

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Sputtering SystemKurt J. Lesker型号 PRO Line PVD 75

PRO Line PVD 75 Versatile Sputtering, Electron Beam, & Thermal Evaporation Thin Film Deposition System Platform

Automate Your Lab.。：The Kurt J. Lesker Company ® PRO Line PVD 75 is the next generation thin film deposition system based on the workhorse PVD 75 platform. W...

型号: PRO Line PVD 75
Product category: Sputtering System
KL-6 Electron Beam source: 100mm Wafer / <=+/-4%
KL-6 Electron Beam source: 150mm Wafer / <=+/-5%

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Sputtering SystemKurt J. Lesker型号 PRO Line PVD 200

PRO Line PVD 200 Versatile Sputtering, Electron Beam, & Thermal Evaporation Thin Film Deposition System Platform

Automate Your Lab.。：The Kurt J. Lesker Company ® PRO Line PVD 200 is a modular, full featured thin film deposition system allowing 8" wafer transfer, up to 8...

型号: PRO Line PVD 200
Product category: Sputtering System
KL-6 Electron Beam Source: Up to 200mm Wafer / <=+/-5%
KL-8 Electron Beam Source: Up to 200mm Wafer / <=+/-5%

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Sputtering SystemKurt J. Lesker型号 AXXIS

AXXIS Co-Sputtering, Thermal Evaporation, & Electron Beam Techniques

AXXIS™ - Facilitates multiple deposition techniques and co-deposited films efficiently!

型号: AXXIS
Product category: Sputtering System
技术参数: AXXIS™ - Facilitates multiple deposition techniques and co-deposited films efficiently!
技术参数: The University of Alberta uses our AXXIS for glancing angle depositions (GLAD).

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Thin Film Deposition SystemKurt J. Lesker型号 Mini SPECTROS

Mini SPECTROS Deposition & Metallization System up to 100mm x 100mm Substrate

Automate Your Lab.。：The Kurt J. Lesker Company ® Mini SPECTROS™ is the next generation thin film deposition system based on the workhorse SPECTROS platform. ...

型号: Mini SPECTROS
Product category: Thin Film Deposition System
Thermal Evaporation Source: 100mm x 100mm / <=+/-5%
KL-6 Electron Beam source: 100mm x 100mm / <=+/-5%

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Thin Film Deposition SystemKurt J. Lesker型号 SPECTROS 150

SPECTROS™ 150 Organic Thin Film Deposition & Metallization System up to 150mm x 150mm Substrate

Automate Your Lab.。：The Kurt J. Lesker Company ® SPECTROS™ 150 is the next generation thin film deposition system based on the workhorse SPECTROS platform. W...

型号: SPECTROS 150
Product category: Thin Film Deposition System
Pump: Torr / mbar
790l/s Turbopump: 9.0E-07 / 1.2E-06

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Thin Film Deposition SystemKurt J. Lesker型号 Super-SPECTROS 200

Super-SPECTROS™ 200 Organic Thin Film Deposition & Metallization System up to 200mm x 200mm Substrate

Automate Your Lab.。：Optimized for organic material deposition。：Up to 12 LTE sources

型号: Super-SPECTROS 200
Product category: Thin Film Deposition System
技术参数: Optimized for organic material deposition
技术参数: Up to 4 thermal evaporation sources

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Sputtering SystemKurt J. Lesker型号 LAB Line UHV

LAB Line High-Performance UHV Platform Optimized for Magnetron Sputtering Applications

Automate Your Lab.。：The Kurt J. Lesker Company ® LAB Line UHV Sputter platform is purpose built for magnetron sputtering deposition applications. A chamber d...

型号: LAB Line UHV
Product category: Sputtering System
技术参数: TORUS ® Magnetron Sputtering (up to 12 sources)
技术参数: Custom configurations are available upon request

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Sputtering SystemKurt J. Lesker型号 CMS

CMS (Combinatorial Materials Science) Series Advanced Research System Utilizing Sputtering or Electron Beam Techniques

Automate Your Lab.。：Extremely capable, advanced research tool

型号: CMS
Product category: Sputtering System
技术参数: Unique system design can be configured for true Ultra High Vacuum performance
技术参数: Adaptable chamber, base plate, and substrate options

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Atomic layer deposition systemKurt J. Lesker型号 ALD-150LE

ALD-150LE™ Thermal ALD Designed for Advanced Research & Development Applications

The ALD-150LE™ Thin Film Deposition System from Kurt J. Lesker Company is engineered for Ultra High Purity (UHP) thermal Atomic Layer Deposition (ALD) proces...

型号: ALD-150LE
Product category: Atomic Layer Deposition System
Substrate Size: Up to 150mm
Substrate Temperature: Up to 500°C

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Atomic layer deposition systemKurt J. Lesker型号 ALD-150LX

ALD-150LX™ Plasma ALD Designed for Advanced Research & Development Applications

The ALD-150LX™ features Kurt J. Lesker Company ® (KJLC ® ) innovative design features including our Patented Precursor Focusing Technique™ (PFT) and our Pate...

型号: ALD-150LX
Product category: Atomic Layer Deposition System
Substrate Size: Up to 150mm
Substrate Temperature: Up to 600°C

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Thin Film Deposition SystemKurt J. Lesker型号 PVD-BATCH DRUM

PVD-BATCH DRUM SERIES

The Kurt J. Lesker Company PVD-BATCH DRUM SERIES consists of two standard sizes (PVD 200 AND PVD 500), which can be configured in either a horizontal or vert...

型号: PVD-BATCH DRUM
Product category: Thin Film Deposition System
DRUM: DRUM Size / Effective Deposition Zones / Total Number Of 1" Substrates Per Effective Zone/Total DRUM
PVD 200: 9" OD Diameter x 15" H / (5) 6" Wide / 48/240

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Thin Film Deposition SystemKurt J. Lesker型号 PEROVSKITE

PEROVSKITE SERIES

Thin Film Deposition Platforms Designed for Optimized Vacuum Processing of Perovskite Devices

型号: PEROVSKITE
Product category: Thin Film Deposition System
技术参数: Thin Film Deposition Platforms Designed for Optimized Vacuum Processing of Perovskite Devices
技术参数: Vacuum evaporation of the perovskite precursor materials can be challenging, necessitating thoughtful system design and hardware components developed to meet the requirements of the application.

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Thin Film Deposition SystemKurt J. Lesker型号 INDIUM

INDIUM SERIES

Designed to Produce Precise Indium Bumps at a Longer Throw Distance for Flip Chip Applications

型号: INDIUM
Product category: Thin Film Deposition System
技术参数: The Kurt J. Lesker INDIUM series is an evaporation platform engineered and optimized for the fabrication of indium bump bonds. It offers user-friendly operation and streamlines maintenance, providing a reliable and versatile solution for this app
技术参数: Long throw indium evaporation system.

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Thin Film Deposition SystemKurt J. Lesker型号 TSV/TGV

TSV/TGV SERIES

Uniform, High-Rate Deposition for Complex TSV/TGV Structures.

型号: TSV/TGV
Product category: Thin Film Deposition System
技术参数: Uniform, High-Rate Deposition for Complex TSV/TGV Structures.
技术参数: TSVs and TGVs can be efficiently fabricated in TSV/TGV Series physical vapor deposition (PVD) systems. Interested in creating TSVs and TGVs for your application? Then let's look at the key building blocks you will need for of a TSV/TGV tool:

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Thermal Vacuum Chamber SystemKurt J. Lesker型号 TVAC

TVAC – Thermal Vacuum Chambers

The Kurt J. Lesker Company (KJLC) is a global pioneer in vacuum technology, offering cutting-edge Thermal Vacuum Chamber (TVAC) solutions designed to simulat...

型号: TVAC
Product category: Thermal Vacuum Chamber System
Small-Scale: Box Chamber, 304 SS, 19.25" (488.95mm) High x 20.5" (520.7mm) Deep x 24" (609.6mm) Wide, Internal Dimensions / CubeSats, Avionics, Modular Payloads / From 10 -6 to 10 -8
Mid-Range: Box chamber, 304 SS, 54" (1371.6mm) High x 48" (1219.2mm) Deep x 72" (1828.8mm) Wide, Internal Dimensions / Subsystems, Deployable Assets, Test Platforms / From 10 -6 to 10 -7

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Sputtering SystemKurt J. Lesker型号 600i Series

600i Series In-Line Sputtering Systems

Precision Thin Film Deposition for High-Density Applications

型号: 600i Series
Product category: Sputtering System
Chamber Ultimate ≤ 1 x 10 -7 torr: ≤ 1 x 10 -7 torr
Chamber Leak Rate 20 min to 1 x 10 -4 torr: 20 min to 1 x 10 -4 torr

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Sputtering SystemKurt J. Lesker型号 744i Series

744i Series In-Line Sputtering Systems

High-Throughput Batch Processing for Large-Area Substrates。：KDF continues to lead the industry in developing reliable in-line sputtering systems engineered f...

型号: 744i Series
Product category: Sputtering System
Chamber Ultimate ≤ 1 x 10 -7 torr: ≤ 1 x 10 -7 torr
Chamber Leak Rate 20 min to 1 x 10 -4 torr: 20 min to 1 x 10 -4 torr

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