分析检测仪器产品目录

光谱与元素分析仪器scia Systems型号 scia Coat 500

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型号: scia Coat 500
Product category: Ion Beam Sputtering
Substrate size (up to): 500 mm x 300 mm, 300 mm dia. for rotation
Substrate holder: Linear movement from 0.1 mm/min up to 15 mm/s, rotation up to 300 rpm (max. 300 mm dia.)

光谱与元素分析仪器scia Systems型号 scia Opto 300

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型号: scia Opto 300
Product category: Ion Beam Sputtering
Substrate size (up to): 300 mm dia.
Substrate holder: Substrate rotation up to 60 rpm, includes optical thickness monitor (OTM) and test glass changer

光谱与元素分析仪器scia Systems型号 scia Multi 300

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光谱与元素分析仪器scia Systems型号 scia Multi 680

Multilayer Coatings for Large Substrates up to 680 mm in dia.

型号: scia Multi 680
Product category: Magnetron Sputtering
Substrate size (up to): 680 mm dia., 130 kg
Sputter source: Up to 6 rectangular magnetrons (610 mm x 89 mm), ion beam source possible

光谱与元素分析仪器scia Systems型号 scia Multi 1500

Multilayer Coatings for Large Substrates up to 1500 mm in dia.

型号: scia Multi 1500
Product category: Magnetron Sputtering
Substrate size (up to): 1500 mm dia., 850 kg
Sputter source: 4 rectangular magnetrons (1219 mm x 89 mm) per chamber, ion beam source possible

光谱与元素分析仪器scia Systems型号 scia Magna 400

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型号: scia Magna 400
Product category: Magnetron Sputtering
Substrate size (up to): 400 mm x 200 mm, 200 mm dia. for spin rotation
Sputter source: 6 rectangular magnetrons (203 mm x 89 mm), ion source possible

光谱与元素分析仪器scia Systems型号 scia Eva 200

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型号: scia Eva 200
Product category: E Beam Evaporation
Substrate size (up to): 200 mm dia.
Substrate holder: Water-cooled, helium backside cooling contact, substrate rotation 5 to 20 rpm, tiltable in-situ from 0° to 180° in 0.1° steps, optional heating