产品目录第 309 页

光谱与元素分析仪器scia Systems型号 scia Multi 680

scia Multi 680

Multilayer Coatings for Large Substrates up to 680 mm in dia.

型号: scia Multi 680
Product category: Magnetron Sputtering
Substrate size (up to): 680 mm dia., 130 kg
Sputter source: Up to 6 rectangular magnetrons (610 mm x 89 mm), ion beam source possible

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光谱与元素分析仪器scia Systems型号 scia Multi 1500

scia Multi 1500

Multilayer Coatings for Large Substrates up to 1500 mm in dia.

型号: scia Multi 1500
Product category: Magnetron Sputtering
Substrate size (up to): 1500 mm dia., 850 kg
Sputter source: 4 rectangular magnetrons (1219 mm x 89 mm) per chamber, ion beam source possible

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色谱与质谱仪器scia Systems型号 scia Magna 200

scia Magna 200

Products Ion Beam Etching Ion Beam Trimming Ion Beam Sputtering scia Cluster 200 more...

型号: scia Magna 200
Product category: Magnetron Sputtering
Substrate size (up to): 200 mm dia.
Substrate holder: Water-cooled, helium backside cooling contact, rotation up to 20 rpm, optional RF bias, electrostatic clamping and wafer heating (up to 1000 °C)

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光谱与元素分析仪器scia Systems型号 scia Magna 400

scia Magna 400 / 500 / 700 / 1200

Products Ion Beam Etching Ion Beam Trimming Ion Beam Sputtering scia Cluster 200 more...

型号: scia Magna 400
Product category: Magnetron Sputtering
Substrate size (up to): 400 mm x 200 mm, 200 mm dia. for spin rotation
Sputter source: 6 rectangular magnetrons (203 mm x 89 mm), ion source possible

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光谱与元素分析仪器scia Systems型号 scia Eva 200

scia Eva 200

Products Ion Beam Etching Ion Beam Trimming Ion Beam Sputtering scia Cluster 200 more...

型号: scia Eva 200
Product category: E Beam Evaporation
Substrate size (up to): 200 mm dia.
Substrate holder: Water-cooled, helium backside cooling contact, substrate rotation 5 to 20 rpm, tiltable in-situ from 0° to 180° in 0.1° steps, optional heating

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光谱与元素分析仪器scia Systems型号 scia Clean 800

scia Clean 800

High-Quality Cleaning and Qualification up to 800 mm in dia. and 500 mm in height

型号: scia Clean 800
Product category: Dry Cleaning
Substrate size (up to): 800 mm dia., 500 mm height, 500 kg
Substrate heating: Radiation heaters (4.5 kW) up to 250 °C

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光谱与元素分析仪器scia Systems型号 scia Clean 1000/1500/3000

scia Clean 1000/1500/3000

High-Quality Cleaning and Qualification up to 3 m in dia. and 3.4 m in length

型号: scia Clean 1000/1500/3000
Product category: Dry Cleaning
Substrate size (up to): 1000 mm dia., 850 mm length, 500 kg
Substrate heating: Radiation heaters (7.5 kW) up to 250 °C

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色谱与质谱仪器scia Systems型号 scia Batch 350

scia Batch 350

Products Ion Beam Etching Ion Beam Trimming Ion Beam Sputtering scia Cluster 200 more...

型号: scia Batch 350
Product category: Pecvd Rie
Substrate size: Individual sizes loaded on 2 carriers, carrier size up to 350 mm x 240 mm
Substrate carrier: Water-cooled, pulsed DC bias (2 kV, 400 mA)

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色谱与质谱仪器scia Systems型号 scia Cube 300

scia Cube 300

Products Ion Beam Etching Ion Beam Trimming Ion Beam Sputtering scia Cluster 200 more...

型号: scia Cube 300
Product category: Pecvd Rie
Substrate size (up to): 300 mm x 200 mm
Substrate holder: Water-cooled, RF bias

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色谱与质谱仪器scia Systems型号 scia Cube 750

scia Cube 750

Products Ion Beam Etching Ion Beam Trimming Ion Beam Sputtering scia Cluster 200 more...

型号: scia Cube 750
Product category: Pecvd Rie
Substrate size (up to): 750 mm x 750 mm
Substrate holder: Water-cooled, RF bias

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色谱与质谱仪器scia Systems型号 scia Inline 400

scia Inline 400

Products Ion Beam Etching Ion Beam Trimming Ion Beam Sputtering scia Cluster 200 more...

型号: scia Inline 400
Product category: Customized Systems
Substrate size (up to): Individual sizes loaded on carrier, carrier size up to 450 mm x 400 mm
Ion beam source: Two 380 mm linear microwave ECR sources (LIN380-e)

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